Intel has now largely dumped 10nm as it retools for 7nm using extreme ultraviolet lithography. Intel has struggled with conventional techniques and the attempt finally has been abandoned.

Extreme ultraviolet is the best approach with the equipment available today from ASML. The steppers are expensive ($120 million) but TSMC has managed to get them working which is why Intel has moved in the same direction. The weight at 120 tons has to also be considered.

In EUV, a power source converts plasma into light at 13.5nm wavelengths. Then the light bounces off several mirrors before hitting the wafer. Current plasma brightness has been limiting the speed of production.

7nm is literally 25% of the size for 14nm. The power saving along can be stupendous for mobile users while more L3 cache can be offered for desktop users.

EUV will probably work down to 5nm before quantum effects and interconnect materials force some changes in materials.

The reason for suspecting the change is that Intel has not offered any 10nm desktop processors.